Mark Yacano and Hari Osofsky talk about their un-panel, “How will technology impact the makeup of law firms,” and discuss how law students should train for the new legal marketplace.
On the Road
Mark Yacano is a recognized innovator in the delivery of legal services. During his 25 years in the legal...
Hari M. Osofsky is dean of Penn State Law and the Penn State School of International Affairs and Distinguished Professor...
Laurence Colletti serves as the producer at Legal Talk Network where he combines his passion for web-based media with...
Technology is becoming more important to law firms, so how should law students and lawyers get involved? In this On The Road report from Inspire Legal, host Laurence Colletti talks to Mark Yacano and Hari Osofsky about their un-panel, “How will technology impact the makeup of law firms,” and discuss how law students should train for the new legal marketplace. They also discuss what tech skills lawyers should understand, such as Microsoft, before going into practice.
Mark Yacano is the global practice leader of managed legal solutions at Major, Lindsey & Africa.
Hari Osofsky is the dean of Penn State Law and the Penn State School of International Affairs She is also a distinguished professor of law, international affairs, and geography.
Recorded on the conference floor, "On the Road" includes highlights and interviews from popular legal events.
Sharon Nelson and Lincoln Mead discuss both current and potential impacts of deepfakes on legal practice.
Jess Birken, Ben Sessions, Gyi Tsakalakis, and Erin Gerstenzang discuss the format of the new Un-Track for Doers at this year’s TECHSHOW.
Brett Burney and Paul Unger share app tips for mobile legal practice.
Mary Shen O’Carroll shares highlights from her keynote address focused on shifts in the legal economy.
Honorees Matt Homann, Pegeen Turner, Colin Lachance, and Sofia Lingos share responses to the topics chosen for their luncheon table talks.
Warren Agin and Benjamin Alarie offer highlights from their presentation at TECHSHOW 2020.